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Showing 1-9 of 9 results for "Trimethylaluminum"
DABAL-Me3
DABAL-Me3 is an adduct of trimethylaluminum and DABCO® that is a free-flowing solid that can be manipulated without the need for an inert atmosphere.
Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers
Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers
Tutorial in Microelectronics and Nanoelectronics
As the electronic industry continues to move towards smaller and smaller devices, researchers must continually strive for technologies to deposit electronic materials with precision at ever-smaller scales. This trend has lead to a variety of techniques used in the microelectronics...
ALD — A Versatile Tool for Nanostructuring
ALD — A Versatile Tool for Nanostructuring
Ellman's Sulfinamides
Ellman's sulfinamide is available in both enantiomeric and racemic forms for your research. This versatile and useful auxiliary has found extensive use both in academics and industry.
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition
igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.
Group 11 Thin Films by Atomic Layer Deposition
In this article, we will discuss coinage metal deposition processes in order to provide a sense of the most critical precursors, reducing agents, and processes.
High Purity Metalorganic Precursors for CPV Device Fabrication
High Purity Metalorganic Precursors for CPV Device Fabrication
Metal Borohydrides
An article about metal borohydrides as hydrogen storage materials

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